full-field [full-wafer] exposure

full-field [full-wafer] exposure
експонування на всьому полі напівпровідникової пластини

English-Ukrainian dictionary of microelectronics. 2013.

Игры ⚽ Поможем написать курсовую

Смотреть что такое "full-field [full-wafer] exposure" в других словарях:

  • Full-frame digital SLR — The sizes of sensors used in most current digital cameras, relative to a 35mm film frame. A full frame digital SLR is a digital single lens reflex camera (DSLR) fitted with an image sensor that is the same size as a 35 mm (36×24 mm) film… …   Wikipedia

  • Depth of field — The area within the depth of field appears sharp, while the areas in front of and beyond the depth of field appear blurry …   Wikipedia

  • radiation measurement — ▪ technology Introduction       technique for detecting the intensity and characteristics of ionizing radiation, such as alpha, beta, and gamma rays or neutrons, for the purpose of measurement.       The term ionizing radiation refers to those… …   Universalium

  • Diffraction topography — (short: topography ) is an X ray imaging technique based on Bragg diffraction. Diffraction topographic images ( topographs ) record the intensity profile of a beam of X rays (or, sometimes, neutrons) diffracted by a crystal. A topograph thus… …   Wikipedia

  • Charge-coupled device — A specially developed CCD used for ultraviolet imaging in a wire bonded package. A charge coupled device (CCD) is a device for the movement of electrical charge, usually from within the device to an area where the charge can be manipulated, for… …   Wikipedia

  • Mathematics and Physical Sciences — ▪ 2003 Introduction Mathematics       Mathematics in 2002 was marked by two discoveries in number theory. The first may have practical implications; the second satisfied a 150 year old curiosity.       Computer scientist Manindra Agrawal of the… …   Universalium

  • Carbon nanotube — Not to be confused with Carbon fiber. Part of a series of articles on Nanomaterials Fullerenes …   Wikipedia

  • Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia

  • University at Albany, SUNY — Coordinates: 42°41′10″N 73°49′26″W / 42.686193°N 73.823884°W / 42.686193; 73.823884 …   Wikipedia

  • Laser — For other uses, see Laser (disambiguation). United States Air Force laser experiment …   Wikipedia

  • Oxygen — This article is about the chemical element and its most stable form, O2 or dioxygen. For other forms of this element, see Allotropes of oxygen. For other uses, see Oxygen (disambiguation). nitrogen ← oxygen → fluorine ↑ O ↓ …   Wikipedia


Поделиться ссылкой на выделенное

Прямая ссылка:
Нажмите правой клавишей мыши и выберите «Копировать ссылку»